CSC21/Co-Cr

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Probe



SEM image of uncoated silicon SPM probe tip

Silicon etched probe tip of the CSC series has a conical shape. Typical probe tip radius of uncoated tip 10 nm Full tip cone angle* 40° Tip aspect ratio more than 3:1 (4:1 typical) Total tip height 20..25 µm Probe material n-type silicon (phosphorus doped) Probe bulk resistivity 0.01..0.05 Ohmcm The full cone angle may be less than 40° at the last 200 nm of the tip end.

Cantilevers



SEM image of triangular cantilever of the CSC21 series.		Schematic drawing of the probe chip.

CSC21 Cantilevers	Resonant Frequency, kHz			Spring Constant, N/m			Length l ± 5, µm	Width w ± 3, µm	Thickness t ± 0.5, µm
CSC21 Cantilevers	min	typ	max	min	typ	max	Length l ± 5, µm	Width w ± 3, µm	Thickness t ± 0.5, µm
A	8	12	17	0.03	0.12	0.3	290	40	1.0
B	65	105	150	0.6	2.0	6.0	110	40	1.0


Coating

The coating consists of a Co layer of about 60-nm thickness on the tip and backside of the cantilever. The Co layer is formed as a polycrystalline film, which allows steady permanent magnetization in the direction of the tip axis. All chips are pre-magnetized at the facility before shipping to end users. In some cases additional magnetization by an arbitrary strong magnet is required. The Co coating is protected from oxidation by a 20-nm Cr layer, resulting in longer cantilever performance. Resulting tip radius with the coating 90.0 nm

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