- 1 nm
- 1 nm
- 100 - 200 nm
- < 1 nm
- 12 - 18 µm
- n-type silicon
- 0.01 - 0.025 Ohm*cm
HIGH RESOLUTION AFM PROBES
ApplicationMore and more AFM is becoming the tool of choice for non-destructive surface measurements with molecular and sub-molecular resolution. However, the resolution and accuracy of the technique is limited by the size and shape of the tip. In order to increase resolution, it is necessary to both decrease the tip size and the tip-sample interaction force.
The development of the line of Hi’Res probes has overcome these obstacles and made higher resolution, sub-nanometer imaging possible. The Hi’Res probes allow for more accurate measurement of extremely narrow features such as pores, trenches, and sharp edges, along with accurate measurement of sub-nanometer surface roughness.
In addition, these probes are also good for imaging soft, fragile and near-liquid samples as the tip-sample attraction force is significantly reduced due to the unsurpassed subnanometer tip radius.
Routine height images of carbosilane dendrimers (9th generation) in a dense film obtained using Multimode Nanoscope IIIa AFM (Veeco Metrology Group). Scan size 150 nm. Diameter of dendrimer molecules is 9 nm. Images courtesy of S.S. Sheiko (University of North Caroline at Chapel Hill) and D.A. Ivanov (Free University of Brussels). Dendrimers courtesy of A. M. Muzafarov (ISPM RAS, Moscow.)
High-resolution probes are recommended for scanning small areas below 250 nm at 512 sampling points. Lateral resolution below 1 nm is attainable.